Basic Information
Artist(s):
Title:
RP28 Diptych
Medium:
Surface Size:
14.25 x 10.75 in.
Framed Size:
17.25 x 15.5 in.
Date Created:
1975
Inventory #:
Beyls-1975-01(a,b)
Description
each signed and dated on the reverse in graphite
“A complementary set of two modular drawings exploring emergent pattern-formation from the critical assembly of many small patterns. A single basic micro-pattern is designed and a vocabulary of 8 patterns results through reflection and rotation. The first drawing is computer from an off-center point towards the edges, a gradual increase of randomness instructs pattern selection from a single option to many. In the second drawing, randomness gradually increases from the edges towards the center”
– “Bit by Bit” exhibition catalogue, Digital Art Museum, Frankfurt, May 2013
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